PSI Ltd, Apex Business Park
Hailsham, East Sussex, BN27 3JU, U.K.

Tel: +44(0) 1323 449001
Fax: +44(0) 1323 449002
email: info@psiltd.co.uk
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Chemical Vapour Deposition & Infiltration (CVD & CVI)

PSI Ltd is a specialist designer and manufacturer for R&D laboratory-scale systems to Production plant for the processing of novel materials. The company has previously designed and installed CVD/CVI equipment for the production of ceramic matrix composites for special applications e.g.satellite technology.

Typical CVD/CVI Coatings:-

 
Coating Material
 
Process Gases
Typical Deposition Temperatures
(degC)
Silicon Carbide
CH3SiCl3
1300
Boron Nitride
BCl3-NH3
1800
Carbon (graphite)
CH4-H2
2200
Titanium Carbide
TiCl4-H2
800
Titanium Nitride
TiCl4-N2
900
Silicon Nitride
SiCl4-N2-NH3
1300
Aluminium Nitride
AlCl3-NH3
800

Chemical vapour deposition and infiltration
The PSI CVD/CVI systems are designed and tested to international standards. Constructed from stainless steel the vacuum-pressure vessel encases either a vertically or horizontally orientated corrosion-resistant furnace. Typically manufactured in graphite the retort facilitates hot zones of 600mm diameter x 900mm long down to research-scale systems of 150mm diameter x 460mm. Furnace temperatures of 1300degC are achieved as standard with a high temperature alternative to 2200degC. Specialist, chemically-resistant vacuum facilities are essential as the gas scrubbing system for compliance with local disposal regulations.
With some CVI processing taking days to complete, a fully-automated PLC-based control system and data-logging is essential. Computer-control is available for remote operation and full process data-logging for QC/QA requirements. For client satisfaction purposes, it is PSI’s policy to define the eventual equipment specification only after technical discussion with the client and our own consultants.

Copyright 2010 by Phoenix Scientific Industries Ltd